Extreme Ultraviolet Lithography: Towards the Next Generation of Integrated CircuitsTHE VIEWPOINT - Optical lattice solitons: Guiding and routing light at will

Lithography is the most challenging technology in the semiconductor industry. The most promising next generation lithography technology is extreme ultraviolet lithography (EUVL). EUVL was proposed long ago, in 1988, but its implementation has been postponed several times. Presently, most “showstoppers” are gone, but there are still several challenges that need to be addressed. The semiconductor industry is now getting ready to use EUVL in a pre-production phase, and EUVL might be implemented for 32 nm and 22 nm technological nodes. High volume manufacturing EUVL printers will be delivered to multiple end-users from 2010.